Research Background
Research Background
Presentations:
Here is an excellent presentation given by Dr. Kirsten Moselund about the technology behind the project.
Publications:
Wurtzite InP Microdisks: from Epitaxy to Room-Temperature Lasing
Philipp Staudinger, Svenja Mauthe, Noelia Vico Triviño, Steffen Reidt, Kirsten E. Moselund, Heinz Schmid
arXiv:2004.10677v1 [physics.app-ph] 22 Apr 2020
Exploring the Size Limitations of Wurtzite III–V Film Growth
Philipp Staudinger, Kirsten E. Moselund, Heinz Schmid
Nano Lett. 20(1), 686-693, 2020
InGaAs FinFETs Directly Integrated on Silicon by Selective Growth in Oxide Cavities
C. Convertino, C. Zota, H. Schmid, D. Caimi, M. Sousa, K. Moselund, L. Czornomaz
Materials 12 (1), 87, 2019
Concurrent Zinc-Blende and Wurtzite Film Formation by Selection of Confined Growth Planes
Philipp Staudinger, Svenja Mauthe, Kirsten E. Moselund, Heinz Schmid
Nano Letters 18 (12), 7856-7862, 2018
III-V heterostructure tunnel field-effect transistor
C. Convertino, C. Zota, H. Schmid, A. Ionescu, K. Moselund
Journal of Physics: Condensed Matter 30 (26), 264005, IOP Publishing, 2018